FEATURES MECHANICAL AND CHEMICAL TREATMENT OF SEMICONDUCTOR SILICON PLATES

Authors

  • Muminov Ramizullo Abdullaevich 1Physical-Technical Institute NPO "Physics-Sun" of the Academy of Sciences of the Republic of Uzbekistan, Tashkent, Uzbekistan.
  • Saymbetov Akhmet Kuvanchbekovich Kazakh National University named after Al-Farabi, Almata, Kazakhstan
  • Toshmurodov Yorkin Kakhramonovich 3Karshi branch of the Tashkent Institute of Irrigation and Agricultural Mechanization Engineers, Karshi, Uzbekistan
  • Ergashev Giyos Zhuraevich
  • Yavkochliev Makhmudjon Otamurodovich

Abstract

In this work, the features of technological, mechanical and chemical processing (cutting, grinding, chemical processing, polishing, preparation of crystals for lithium diffusion) for obtaining semiconductor detectors are considered.

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Published

2020-09-22

Issue

Vol. 6 No. 1 (2020): ASSHETC

Section

Articles

How to Cite

FEATURES MECHANICAL AND CHEMICAL TREATMENT OF SEMICONDUCTOR SILICON PLATES. (2020). Archive of Conferences, 6(1), 39-44. https://conferencepublication.com/index.php/aoc/article/view/220

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