FEATURES MECHANICAL AND CHEMICAL TREATMENT OF SEMICONDUCTOR SILICON PLATES

Muminov Ramizullo Abdullaevich; Saymbetov Akhmet Kuvanchbekovich; Toshmurodov Yorkin Kakhramonovich; Ergashev Giyos Zhuraevich; Yavkochliev Makhmudjon Otamurodovich

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Published: Sep 22, 2020

Muminov Ramizullo Abdullaevich

1Physical-Technical Institute NPO "Physics-Sun" of the Academy of Sciences of the Republic of Uzbekistan, Tashkent, Uzbekistan.

Saymbetov Akhmet Kuvanchbekovich

Kazakh National University named after Al-Farabi, Almata, Kazakhstan

Toshmurodov Yorkin Kakhramonovich

3Karshi branch of the Tashkent Institute of Irrigation and Agricultural Mechanization Engineers, Karshi, Uzbekistan

Ergashev Giyos Zhuraevich

Yavkochliev Makhmudjon Otamurodovich

Abstract

In this work, the features of technological, mechanical and chemical processing (cutting, grinding, chemical processing, polishing, preparation of crystals for lithium diffusion) for obtaining semiconductor detectors are considered.

How to Cite

Muminov Ramizullo Abdullaevich, Saymbetov Akhmet Kuvanchbekovich, Toshmurodov Yorkin Kakhramonovich, Ergashev Giyos Zhuraevich, & Yavkochliev Makhmudjon Otamurodovich. (2020). FEATURES MECHANICAL AND CHEMICAL TREATMENT OF SEMICONDUCTOR SILICON PLATES. Archive of Conferences, 6(1), 39-44. Retrieved from https://conferencepublication.com/index.php/aoc/article/view/220

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Vol. 6 No. 1 (2020): ASSHETC

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